Stress and Strain in Epitaxy: Theoretical Concepts, Measurements and Applications PDF Download. Download free ebook of Stress and Strain in Epitaxy: Theoretical Concepts, Measurements and Applications in PDF format or read online by J.-P. Deville,M. Hanbücken 9780080541860 Published on 2001-07-03 by Elsevier
This book contains keynote lectures which have been delivered at the 3rd Porquerolles' School on Surface Science, SIR2000 (Surfaces-Interfaces-Relaxation). The aim of this school was to review the main concepts necessary to understand the role of interfacial stress, strain and relaxation in crystal growth by heteroepitaxy. By bringing together scientists from various fields (physics, chemistry, materials science and engineering) which daily use complementary methodological approaches (experiment, theory, modelization), the school allowed to offer 11 multidisciplinary courses. This book addresses the state of art of stress in epitaxial materials, it describes the various methods to measure the atomic displacement and stress fields, it reviews the spectroscopic methods necessary to map the interface chemistry, it details the theoretical methods and concepts which are needed to predict them and it questions the fact that stress and relaxation can induce specific properties in magnetism, catalysis, electron transport and so on. The field of stress and strain in heteroepitaxy has know large developments during the last ten years. New techniques have been used to set up new devices in which functionalities are obtained through structuration at a nanometer scale. Large-scale integration and reduced dimensions are the key factors to optimize the achievements of these devices. Already used in industry (quantum wells, magnetic sensors), these devices are obtained by molecular beam epitaxy, sputtering or pulsed laser deposition. Their reduced dimensionality increased the number of surfaces and interfaces, the role of which has to be precised. Experimentalists try now to associate materials having very different crystal structure and chemical composition. The elastic stress stored in the device can induce various phenomena which have to be evaluated, understood and predicted. The book intends also to show that many questions are still in debate.
This Book was ranked at 32 by Google Books for keyword Theoretical.
Book ID of Stress and Strain in Epitaxy: Theoretical Concepts, Measurements and Applications's Books is 08VJ1IrMjykC, Book which was written by J.-P. Deville,M. Hanbücken have ETAG "rEwvL9Gp4mg"
Book which was published by Elsevier since 2001-07-03 have ISBNs, ISBN 13 Code is 9780080541860 and ISBN 10 Code is 0080541860
Reading Mode in Text Status is false and Reading Mode in Image Status is true
Book which have "332 Pages" is Printed at BOOK under CategoryScience
Book was written in en
eBook Version Availability Status at PDF is true and in ePub is false
Book Preview
Download Stress and Strain in Epitaxy: Theoretical Concepts, Measurements and Applications PDF Free
Download Stress and Strain in Epitaxy: Theoretical Concepts, Measurements and Applications Books Free
Download Stress and Strain in Epitaxy: Theoretical Concepts, Measurements and Applications Free
Download Stress and Strain in Epitaxy: Theoretical Concepts, Measurements and Applications PDF
Download Stress and Strain in Epitaxy: Theoretical Concepts, Measurements and Applications Books
No comments:
Post a Comment